MOS-AK ESSDERC/ESSCIRC Workshop Sept 11, 2017, Leuven
Compact modeling for CMOS technology development and IC design
Daniel Tomaszewski
Institute of Electron Technology (ITE), Warsaw, Poland
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 2
Władek Grabiński (MOS-AK),
Prof. Andrzej Jakubowski, Prof. Lidia Łukasiak, Dr. Jan Gibki (WUT),
Dr. Grzegorz Głuszko, Jola Malesińska, Dr. Krzysztof Kucharski, Dr. Krzysztof Domański, Prof. Jacek Marczewski, Dr. Michał Zaborowski, Hubert Hara (ITE),
Prof. Mike Brinson (London Metropolitan University),
Prof. Benjamin Iñiguez (URV),
Dr. Marat Yakupov (formerly: ITE, MunEDA; currently: Infineon)
Acknowledgments
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 3
Outline
G. Coram, "Tutorial: How to (and How NOT to) Write a Compact Model in Verilog-A", 2004 IEEE Behavioral Modeling and Simulation Confence (BMAS 2004)
gate-level model
compact model
TCAD model
spe
ed
accuracy
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 4
Outline
G. Coram, "Tutorial: How to (and How NOT to) Write a Compact Model in Verilog-A", 2004 IEEE Behavioral Modeling and Simulation Confence (BMAS 2004)
gate-level model
compact model
TCAD model
spe
ed
accuracy
IC design technology
development
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 5
Outline
gate-level model
compact model
TCAD model
spe
ed
accuracy
IC design technology
development
G. Coram, "Tutorial: How to (and How NOT to) Write a Compact Model in Verilog-A", 2004 IEEE Behavioral Modeling and Simulation Confence (BMAS 2004)
Compact modeling • PDSOI MOSFET modeling • Energy harvesting modeling
Compact modeling for technology development • Examples of parameter extraction methods • FOSS-based project for CM characterization
Compact modeling for IC design • CDF-based method for the yield-oriented ID design
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 6
Compact modeling (CM) - DC and AC (NQS) model of PDSOI MOSFETs
Phenomena: • Transport at the Si-SiO2 interface
(diffusion/drift) • Diffusion in the floating body + recombi-
nation of the minority carriers • Thermal generation/recombination in the
space-charge areas • Avalanche ionization • Displacement currents (AC analysis)
𝑖𝑆 𝑡 + 𝑖𝐺𝑓 𝑡 +𝑖𝐷 𝑡 +𝑖𝐺𝑏 𝑡 = 0
𝑣 𝑦, 𝑡 = 𝑉 𝑦 + 𝑣∗ 𝑦 ∙ 𝑒𝑗𝜔𝑡 𝐼𝑆 + 𝐼𝐺𝑓 + 𝐼𝐷 + 𝐼𝐺𝑏 = 𝐼𝑆 + 𝐼𝐷 = 0 → 𝑉𝐵𝑆 𝑖𝑠
∗ + 𝑖𝑔𝑓∗ + 𝑖𝑑𝐷
∗ + 𝑖𝑔𝑏∗ = 0 → 𝑣𝑏𝑠
∗
𝑣𝑐𝑓∗ − 𝑣𝑔𝑓𝑠
∗ − 𝑣𝑡ℎ𝑓∗ = 1 + 𝑗𝜔 ∙ 𝐹 + 𝑗𝜔 2 ∙ 𝐹2 +⋯ 𝑓 𝑉𝑐𝑓
𝐹 ∙ − 𝑖𝑛𝑡𝑒𝑔𝑟𝑎𝑙 𝑜𝑝𝑒𝑟𝑎𝑡𝑜𝑟
𝑣𝑐𝑓∗ − 𝑣𝑔𝑓𝑠
∗ − 𝑣𝑡ℎ𝑓∗ ≈ 1 + 𝑗𝜔 ∙ 𝐹 𝑓 𝑉𝑐𝑓
H.-K.Yu, et al., "A Physical Model of Floating Body Thin Film Silicon-On-Insulator nMOSFET with Parasitic Bipolar Transistor", IEEE Trans. El. Dev., Vol.41, pp.726-733
J.R.Hauser, "Small Signal Properties of Field Effect Devices", IEEE Trans. El. Dev., Vol.12, pp.605-618
S.E.Laux, "Techniques for Small-Signal Analysis of Semiconductor Devices", IEEE Trans. El. Dev., Vol.32, pp.2028-2037
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 7
Compact modeling (CM) - DC and AC (NQS) model of PDSOI MOSFETs
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 8
Compact modeling (CM) - DC and AC (NQS) model of PDSOI MOSFETs
D.Tomaszewski, A.Jakubowski, J.Gibki, T.Dębski, M.Korwin-Pawłowski, "Influence of Silicon Film Parameters on C-V Characteristics of Non-Fully Depleted SOI MOSFETs", in: "Perspectives, Science and Technology for Novel Silicon-On-Insulator Devices", Ed. P.L.F.Hemment, V.S.Lysenko, A.N.Nazarov, NATO Science Series, Series 3. High Technology, Vol. 73, 2000 Kluwer Academic Publishers, pp. 295-305, D.Tomaszewski, K.Domański, L.Łukasiak, A.Zaręba, J.Gibki, A.Jakubowski, "DC and AC Models of Partially-Depleted SOI MOSFETs in Weak Inversion", in: "Progress in SOI Structures and Devices Operating at Extreme Conditions", Ed. F.Balestra, A.N.Nazarov, V.S.Lysenko, NATO Science Series, Series II. Mathematics, Physics and Chemistry, Vol. 58, 2002 Kluwer Academic Publishers, pp. 289-298 W.Grabiński, D.Tomaszewski, L.Lemaitre, A.Jakubowski, "Standardization of the compact model coding: non-fully depleted SOI MOSFET example", Journal of Telecommunications and Information Technology, vol. 1, 2005, pp. 135 - 141
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 9
Compact modeling (CM) – energy harvesting
S.Boisseau, G.Despesse, S.Monfray, O.Puscasu, T.Skotnicki, "Semi-flexible bimetal-based thermal energy harvesters", Smart Materials and Structures 22, 1-8, 2013.
ph
ase
"s,c
-h"
ph
ase
"s, h
-c"
phase "h"
phase "c"
temperature Ts,c-h Ts,h-c
mem
bra
ne
dis
pla
cem
ent yc-tp,c
yh+tp,h
ys,h-c
ys,c-h
po
ten
tial
Vc
e,c
ele
ctri
c
fie
ld
p,c
Vb
p,h
e,h
Vh
e,c
e,h
char
ge
de
nsi
ty
Ee,c
Eo,c
Eo,c Ep,c
Ep,h
Ep,h
Eo,h Ee,h
cooler
electret at cooler side (e)
air gap at cooler side (o)
air gap at heater side (o)
parylene at heater side (p)
parylene at cooler side (p)
electret at heater side (e)
heater
bimetallic spring
y
y-tp,h
y+tp,c
yh
yh-te,h
yc
yc+te,c
D. Tomaszewski, K. Domański, P. Prokaryn, "Qucs-based Development of an Energy Harvester Compact Model", 22nd Int. Conf. Mixed Design of Integrated Circuits and Systems, MIXDES, June 25-27, 2015, Torun, Poland
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 10
Compact modeling (CM) – energy harvesting
Platform: Quite Universal Circuit Simulator (Qucs)
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 11
curr
ent
flo
win
g fr
om
tra
nsd
uce
r,
volt
age
at
tran
sdu
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ou
tpu
t,
curr
ent
flo
win
g to
load
cap
acit
or
volt
age
at
load
CLoad = 1 F, RLoad = 1 T CLoad = 0.1 F, RLoad = 1 G
Compact modeling (CM) – energy harvesting
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 12
Two measurement configurations for the MOSFET with serial source / drain resistances.
CM for technology development – parametr extraction methods
D.Tomaszewski, G.Głuszko, J.Malesińska, et al., "A simple method for characterization of MOSFET serial resistance asymmetry", Proc. 2015 Int. Conf. on Microelectronic Test Structures, Tempe, AZ, 2015, pp. 116-121.
In saturation range:
𝐼𝐷1 2 = 0.5 ∙ 𝛽 ∙ 𝑉𝐺 − 𝑉𝑆1 2′ − 𝑉𝑇
2=
= 0.5 ∙ 𝛽 ∙ 𝑉𝐺𝑆 − 𝑉𝑇 − 𝐼𝐷1 2 ∙ 𝑅𝑆 𝐷2
𝐼𝐷1 2 − 0.5 ∙ 𝛽 ∙ 𝑉𝐺𝑆 − 𝑉𝑇 =
− 0.5 ∙ 𝛽 ∙ 𝐼𝐷1 2 ∙ 𝑅𝑆 𝐷
VT, β from non-saturation range; Ideally ( linearity, (0.0) offset of regression )
𝑅𝑆 𝐷 = − 2 𝛽 ∙ 𝐼𝐷1 2 − 𝑉𝐺𝑆 − 𝑉𝑇 𝐼𝐷1 2
Extraction of the source/drain resistances in MOSFETs
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 13
WxL VBS=-4 V VBS=0 V VBS=4 V
20x10 558 / 457 600 / 496 563 / 451
20x5 861 / 567 935 / 612 899 / 582
20x3 595 / 316 728 / 451 681 / 430
S. E. Laux, "Accuracy of a n Effective Channel Length/External Resistance Extraction Algorithm for MOSFET‘s", IEEE Transactions on Electron Devices, Vol. 31, No. 9, 1984, pp. 1245-1251
new method (RS / RD)
CM for technology development – parametr extraction methods
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 14
CM for technology development – parametr extraction methods
D.Tomaszewski, G.Głuszko, J.Malesińska, "A method for combined characterization of MOSFET threshold voltage and junction capacitance eliminating channel current effect", Proc. 2016 EUROSOI-ULIS, Jan 25-27, 2016, Vienna, D.Tomaszewski, G.Głuszko, L.Łukasiak, K.Kucharski, J.Malesińska, "Elimination of the channel current effect on the characterization of MOSFET threshold voltage using junction capacitance measurements", Solid-State Electronics, 128 (2017), 92-101
Characterization of the MOSFET threshold voltage and junction capacitance
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 15
CM for technology development – parametr extraction methods
𝑉𝑡ℎ = 𝑉𝑡ℎ0 +
+𝑡 ∙ 𝛾 ∙ 2𝜑𝐹 − 𝑡 ∙ 𝑉𝐵𝑆 − 2𝜑𝐹 𝑉𝑡ℎ0 = 𝑉𝑡ℎ 0 𝑉𝑡ℎ − 𝑉𝑡ℎ0 =
− 0.5 ∙ 𝑡 ∙ 𝛾2𝑑𝑉𝑡ℎ𝑑𝑉𝐵𝑆 − 𝑡 ∙ 𝛾 ∙ 2𝜑𝐹
Par. extraction
𝐶𝑏𝑠 = 𝐶𝐽 ∙ 1 − 𝑡 ∙ 𝑉𝐵𝑆 𝑉𝑏𝑖 −𝑀𝐽
𝐶𝐽 = 𝐶𝑏𝑠 0
𝑉𝑏𝑠 = −𝑀𝐽 ∙ 𝐶𝑏𝑠𝑑𝐶𝑏𝑠
𝑑𝑉𝐵𝑆 + 𝑡 ∙ 𝑉𝑏𝑖
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 16
CM for technology development - FOSS-based project
electrical simulation programs
D.Tomaszewski, G.Głuszko, M.E.Brinson, V.Kuznetsov, W.Grabinski, "FOSS as an Efficient Tool for Extraction of MOSFET Compact Model Parameters", Proc. 23rd Int. Conf. Mixed Design of Integrated Circuits and Systems, MIXDES, June 23-25, 2016, Lodz, Poland
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 17
CM for IC design – yield-oriented design optimization
• To develop a design methodology oriented towards parametric yield maximization by incorporation of a process variability
• To use in a practical way results of a statistical modeling (BPV method) • CDF-based approach & FOSS environment
• Solution in D domain:
𝑚𝑎𝑥 P 𝑋𝑖,𝑚𝑖𝑛 ≤ 𝑋𝑖 𝑫,𝑴 ≤ 𝑋𝑖,𝑚𝑎𝑥
𝑁𝑋
𝑖=1
≈ 𝑚𝑎𝑥 P 𝑋𝑖,𝑚𝑖𝑛 ≤ 𝑋𝑖 𝑫,𝑴 ≤ 𝑋𝑖,𝑚𝑎𝑥
𝑁𝑋
𝑖=1
= 𝐶𝐷𝐹𝑖 𝑋𝑖,𝑚𝑎𝑥 − 𝑋𝑖 𝑫,𝑴𝑛𝑜𝑚 − 𝐶𝐷𝐹𝑖 𝑋𝑖,𝑚𝑖𝑛 − 𝑋𝑖 𝑫,𝑴𝑛𝑜𝑚
𝑁𝑋
𝑖=1
M.Yakupov, D.Tomaszewski, "Analysis of selected methods for CMOS integrated circuit design for yield optimization", Proc. 18th Int. Conf. Mixed Design of Integrated Circuits and Systems, MIXDES, June 16-18, 2011, Gliwice, Poland M.Yakupov, D.Tomaszewski, "Parametric Yield-oriented IC Design based on Cumulative Distribution Function and Open-Source EDA Tools", MOS-AK/GSA Workshop at ESSDERC/ESSCIRC, Bordeaux, Sept 21, 2012
0
0.1
0.2
0.3
0.4
0.5
0.6
-3 -2 -1 0 1 2 3
x [arb. units]
pro
bab
ility d
ensi
ty f
unct
ion
Xmax - X(D,Mnom)Xmin - X(D,Mnom)
MOS-AK ESSDERC/ESSCIRC Workshop, Sept 11, 2017, Leuven 18
Case study: 5-stage ring oscillator Globar variations considered (local
variations may be included) Performances
• X1 = osc. frequency, • X2 = power;
Tools: • BSIM3v.3 model in ngspice • Octave environment:
- random number generation, - data to/from ngspice, - ngspice exec. in batch mode - graphics;
• R: - correlations;
CM for IC design – yield-oriented design optimization
osc. frequency
consumed power
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